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Photoresists

Duyệt theo:
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Materials and processes for next generation lithography

Tác giả: Alex Robinson, Richard Lawson

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next ...

  • Vị trí lưu trữ: 03 Quang Trung
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