CSDL sách
- Materials and processes for next generation lithography
- Frontiers of nanoscience
- Tác giả: Alex Robinson, Richard Lawson
- Nhà xuất bản: Elsevier Science - San Diego
- Năm xuất bản: 2016
- Số trang:636 p.
- Kích thước:26 cm.
- Số đăng ký cá biệt:49505
- ISBN:9780081003541
- Mã Dewey:621.83153
- Đơn giá:0
- Vị trí lưu trữ:03 Quang Trung
- Ngôn ngữ:English
- Loại tài liệu:Sách Chuyên ngành
- Đang rỗi/ Tổng sách:2/2
- Từ khóa:Microlithography, photoresists
- Chủ đề: Microlithography & Photoresists
- Chuyên ngành: Khoa Điện - Điện tử
- Tóm tắt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.
- Sách điện tử:http://thuvienso.duytan.edu.vn/handle/123456789/307271
Sách cùng chuyên ngành
- Practical electronics for inventors : 4th ed.
- Exploring Arduino® : tools and techniques for engineering wizardry : 2nd ed.
- Wireless communications and networking for unmanned aerial vehicles
- Engineers' survival guide : advice, tactics, and tricks : after a decade of working at Facebook, Microsoft, and Snapchat
- Electronic devices : conventional current version : 10th ed.